Tuesday, March 27, 2012

Optical Comm: March 26



This Topic Consider Situation of Interconnection of Computer Chip

  • 電子connection 的問題: pin count proportional to bandwidth, large pin will be needed.
  • Electronic interconnect limits over all system performance.
  • Optical interconnection provides more bandwidth possibility.
  • Optical approach can be more easily modulated for multiplexing, and bit modulation => Power Efficiency
  • All optical systems require no additional EO conversion, which is power consumption.
  • Electronic system needs buffer when bus is busy, this is proportional to the core number , but optics need only optical relay device to hold signal.


  • Optical routing is immunity to computer scale, which can reach up few meter.






  • Use waveguide incorporate total internal reflection can reach 45 degree turning. 
  • X^3 Effect changes refractive index through carrier concentration, while X^2 uses electrically to modulate the refractive index.
  • refractive index of Silicon is 3.5, silicon nitride is 2.4. For a ring coupler, if difference of refractive index is large, the light is very confinemneted in the waveguide so the evalancent wave is small, causing the gap between waveguide and ring is small.


Friday, March 23, 2012

MacSoft : Aptana studio

 用來編輯Webscript 的. Open Source, 不用錢. 太妙了我居然有下載這種東西.


http://aptana.com/

Fabrication : Etching - Overetch is useful

 一般來說Overetch 可能會侵蝕到原本不想蝕刻的地方, 導致Pattern distortion. 不過有時候倒是能夠利用Overetch 底下的面積, 來縮減Pattern間的間隙. This is called controlled overetch.  以下按例附圖XD



Fabrication : Photolithography Roadmap

我覺得讀書, 有好的圖表是很重要的XD 至少對我來說是這樣. 以下放上一張Lithography的演進表,如果對Lithography的技術已經有點概念, 再回來看這張應該滿有感覺的XD


原文出處:http://chemgroups.northwestern.edu/odom/chem445/Lecture%208%20--%20Nanofabrication.pdf

Lecture : nterdisciplinary Chemistry, Engineering, and Physics

有些講義做得滿好的, 有趣的是可以看出每個老師的風格還有用心程度XDDD
其中我覺得Eril Chen的講義有條理又清楚, 不失為作為一個參考.

http://www.mrsec.harvard.edu/education/ap298r.php

Fabrication: Wet-Etching - Common Etchant


Fabrication : Dry Etching - RIE (Reactive Ion Etching)


      **Plasma 的用意在于用電性控制帶電離子方向, 藉以增加控制離子撞擊的方向性.