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Friday, March 23, 2012

Fabrication : Etching - Overetch is useful

 一般來說Overetch 可能會侵蝕到原本不想蝕刻的地方, 導致Pattern distortion. 不過有時候倒是能夠利用Overetch 底下的面積, 來縮減Pattern間的間隙. This is called controlled overetch.  以下按例附圖XD



Posted by maclist at 1:57 AM
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Labels: Fabrication, Wet Etching

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Blog Archive

  • ▼  2012 (29)
    • ►  June (2)
    • ►  May (2)
    • ►  April (7)
    • ▼  March (18)
      • Optical Comm: March 26
      • MacSoft : Aptana studio
      • Fabrication : Etching - Overetch is useful
      • Fabrication : Photolithography Roadmap
      • Lecture : nterdisciplinary Chemistry, Engineering,...
      • Fabrication: Wet-Etching - Common Etchant
      • Fabrication : Dry Etching - RIE (Reactive Ion Etch...
      • Fabrication : Comparison of Wet and Dry Etching
      • Fabrication : Dry Etching
      • Fabrication : Lithography-Pattern Generation (Fig)
      • Fabrication : Wet Etching - (矽,GaAs)晶體切面圖
      • Latex: 自定義指令
      • Latex: 表格包含註解
      • Latex: 三線表格
      • Cookbook: 滷牛肉
      • Latex: 公式微調 (公式過寬,水平間距調整)
      • Latex: 生成公式
      • Latex: 讓圖形並排

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