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Friday, March 23, 2012

Fabrication : Dry Etching

Why Do we Need Dry Etching
(1) 更小的feature size
(2) 非等向性的蝕刻



下圖比較(Comparison)各種Dry Etching Techniques 所需要的條件(Conditions) 以及環境(Environmental)

原文轉自:
http://www.mrsec.harvard.edu/education/ap298r2004/Erli%20chen%20Fabrication%20III%20-%20Etching.pdf
Posted by maclist at 12:00 AM
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Labels: Dry Etching, Figure, IIIV-Fabrication, Lithography

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Blog Archive

  • ▼  2012 (29)
    • ►  June (2)
    • ►  May (2)
    • ►  April (7)
    • ▼  March (18)
      • Optical Comm: March 26
      • MacSoft : Aptana studio
      • Fabrication : Etching - Overetch is useful
      • Fabrication : Photolithography Roadmap
      • Lecture : nterdisciplinary Chemistry, Engineering,...
      • Fabrication: Wet-Etching - Common Etchant
      • Fabrication : Dry Etching - RIE (Reactive Ion Etch...
      • Fabrication : Comparison of Wet and Dry Etching
      • Fabrication : Dry Etching
      • Fabrication : Lithography-Pattern Generation (Fig)
      • Fabrication : Wet Etching - (矽,GaAs)晶體切面圖
      • Latex: 自定義指令
      • Latex: 表格包含註解
      • Latex: 三線表格
      • Cookbook: 滷牛肉
      • Latex: 公式微調 (公式過寬,水平間距調整)
      • Latex: 生成公式
      • Latex: 讓圖形並排

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